HOME > 제품정보 >반도체 부문

Wafer Wet Cleaner
원산지 : .
규격 : .
특징 : .
용량 : .
방문주기 : .
가격 : .원

General Specification
  - Wafer Application : 5”, 6”, 8” and 12” Silicon wafer
  - Processing Method : Cassetteless or Cassette Type
  - 50 ~ 52 Wafer/Batch (Option)
  - Bath : Teflon and Quartz
  - Controller : PLC & Touch Based Control
  - Semi or Fully Automatic Control
  - FDC, Scheduling , Host On Line.

Components
  - Mega-sonic & Circulation Unit.
  - Spin & IPA, Maranggoni  Dryer
  - Wafer Count Function & Chucking Sensor
  - Flow Control & Spiking Function
  - Ulpa-Filter & Inverter Control

Wet Station 개조
  - H/W & Bath , Control Modify
  - Maker : TEL, DNS, SES, ETC.